TIMBRE TECHNOLOGIES, INC.
72Patents
16Active
72Granted
50Portfolio score
Filing activity: Nov 28, 2000 → Oct 20, 2021 · 14 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6785638B2 | Method and system of dynamic learning through a regression-based library generation process | Physics | 166 | Expired |
| US6943900B2 | Generation of a library of periodic grating diffraction signals | Physics | 122 | Expired |
| US6699624B2 | Grating test patterns and methods for overlay metrology | Physics | 117 | Expired |
| US6772084B2 | Overlay measurements using periodic gratings | Physics | 115 | Expired |
| US6891626B2 | Caching of intra-layer calculations for rapid rigorous coupled-wave analyses | Physics | 104 | Expired |
| US6608690B2 | Optical profilometry of additional-material deviations in a periodic grating | Physics | 92 | Expired |
| US6768983B1 | System and method for real-time library generation of grating profiles | Physics | 88 | Expired |
| US6721691B2 | Metrology hardware specification using a hardware simulator | Physics | 84 | Expired |
| US6609086B1 | Profile refinement for integrated circuit metrology | Physics | 54 | Expired |
| US7072049B2 | Model optimization for structures with additional materials | Physics | 37 | Expired |
| US7092110B2 | Optimized model and parameter selection for optical metrology | Physics | 36 | Expired |
| US7126700B2 | Parametric optimization of optical metrology model | Physics | 34 | Expired |
| US6792328B2 | Metrology diffraction signal adaptation for tool-to-tool matching | Electricity | 34 | Expired |
| US7330279B2 | Model and parameter selection for optical metrology | Physics | 33 | Expired |
| US7280229B2 | Examining a structure formed on a semiconductor wafer using machine learning systems | Physics | 31 | Expired |
| US7031894B2 | Generating a library of simulated-diffraction signals and hypothetical profiles of periodic gratings | Physics | 31 | Expired |
| US7065423B2 | Optical metrology model optimization for process control | Physics | 30 | Expired |
| US7064829B2 | Generic interface for an optical metrology system | Physics | 28 | Expired |
| US7224471B2 | Azimuthal scanning of a structure formed on a semiconductor wafer | Physics | 27 | Expired |
| US7171284B2 | Optical metrology model optimization based on goals | Physics | 27 | Expired |
| US6804005B2 | Overlay measurements using zero-order cross polarization measurements | Physics | 26 | Expired |
| US6636843B2 | System and method for grating profile classification | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6775015B2 | Optical metrology of single features | Physics | 24 | Expired |
| US7046375B2 | Edge roughness measurement in optical metrology | Physics | 23 | Expired |
| US6791679B2 | Adaptive correlation of pattern resist structures using optical metrology | Emerging Cross-Sectional Technologies | 21 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.