Polymer blend and associated methods of preparation and use
US6794110B2 · kind B2 · utility
11Cited by
5References
59Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2002 |
| Grant date | Sep 21, 2004 |
| Priority date | — |
| Expiry date | Dec 27, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/108
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including wavelengths of 157 nm, 193 nm and 248 nm, and has improved sensitivity and resolution. Processes for preparing and using the polymer blend are also provided, as are lithographic photoresist compositions that contain the polymer blend.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.