Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure
US6797368B2 · kind B2 · utility
4Cited by
2References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 26, 2003 |
| Grant date | Sep 28, 2004 |
| Priority date | — |
| Expiry date | Feb 26, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24942
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A reflective-type mask blank for exposure comprises a substrate (11), a reflective multilayer film (12) formed on the substrate for reflecting light, and an absorber film (14) formed on the reflective multilayer film. A protection layer (15) is formed on side surfaces of the reflective multilayer film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.