Gas flow controller system
US6799603B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 20, 1999 |
| Grant date | Oct 5, 2004 |
| Priority date | — |
| Expiry date | Sep 20, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87249
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas flow controller system includes a support structure and a gas manifold and gas manifold inlet valve located at the support structure. The gas manifold is coupled to one or more injector ports of a reactor by a process gas supply line. The reactor is supported by the support structure. Since the gas manifold and the gas manifold inlet valve are also located at the support structure, the length of the gas manifold and the process gas supply line is relatively short. Due to this relatively short length, process gas within the gas manifold and the process gas supply line is removed in a relatively short time after the flow of process gas to the gas manifold is shut off.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.