Patent · US Expired

Method and structure for reducing effects of noise and resonance associated with an e-beam lithography tool

US6800864B2 · kind B2 · utility

3Cited by
2References
6Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 29, 2002
Grant dateOct 5, 2004
Priority date
Expiry dateOct 29, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/30461
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

An apparatus and method for reducing noise and resonance detractors connected with and E beam tool. The invention provides a plurality of embodiments. In one embodiment, the E beam tool will be calibrated and the results will be then filtered to counter the effects of the noise afterwards. In an alternate embodiment of the present invention, a filter is applied in the actual feedback of the E beam tool for the writing cycle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.