Michael E. Scaman
22Patents
7h-index
30Co-inventors
65Inventor score
Filing activity: Feb 18, 1994 → Dec 7, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5821759A | Method and apparatus for detecting shorts in a multi-layer electronic package | Physics | 29 | Expired |
| US6242923A | Method for detecting power plane-to-power plane shorts and I/O net-to power plane shorts in modules and printed circuit boards | Physics | 19 | Expired |
| US6141093A | Method and apparatus for locating power plane shorts using polarized light microscopy | Physics | 17 | Expired |
| US7187179B1 | Wiring test structures for determining open and short circuits in semiconductor devices | Electricity | 14 | Expired |
| US5818239A | Simplified contactless test of MCM thin film I/O nets using a plasma | Physics | 9 | Expired |
| US7353472B2 | System and method for testing pattern sensitive algorithms for semiconductor design | Physics | 8 | Expired |
| US8161421B2 | Calibration and verification structures for use in optical proximity correction | Physics | 7 | Active |
| US5448650A | Thin-film latent open optical detection with template-based feature extraction | Physics | 7 | Expired |
| US6400128B2 | Thermal modulation system and method for locating a circuit defect | Physics | 6 | Expired |
| US6005966A | Method and apparatus for multi-stream detection of high density metalization layers of multilayer structures having low contrast | Physics | 6 | Expired |
| US7360199B2 | Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC) | Physics | 4 | Active |
| US5936408A | Simplified contactless test of MCM thin film I/O nets using a plasma | Physics | 4 | Expired |
| US6236196A | Thermal modulation system and method for locating a circuit defect such as a short or incipient open independent of a circuit geometry | Physics | 3 | Expired |
| US6800864B2 | Method and structure for reducing effects of noise and resonance associated with an e-beam lithography tool | Electricity | 3 | Expired |
| US8174681B2 | Calibration of lithographic process models | Physics | 1 | Active |
| US8201132B2 | System and method for testing pattern sensitive algorithms for semiconductor design | Physics | 1 | Active |
| US7975246B2 | MEEF reduction by elongation of square shapes | Emerging Cross-Sectional Technologies | 1 | Active |
| US6781141B2 | Method and structure for detection and measurement of electrical and mechanical resonance associated with an E-beam lithography tool | Electricity | 0 | Expired |
| US7673279B2 | Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC) | Physics | 0 | Active |
| US7685544B2 | Testing pattern sensitive algorithms for semiconductor design | Physics | 0 | Active |
| US7808257B2 | Ionization test for electrical verification | Physics | 0 | Expired |
| US6785615B2 | Method and structure for detection of electromechanical problems using variance statistics in an E-beam lithography device | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.