Photoresist compositions comprising blends of photoacid generators
US6803169B2 · kind B2 · utility
6Cited by
11References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2001 |
| Grant date | Oct 12, 2004 |
| Priority date | — |
| Expiry date | Jul 8, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.