Patent · US Expired

Method, system and holder for transferring templates during imprint lithography processes

US6805054B1 · kind B1 · utility

44Cited by
20References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 14, 2003
Grant dateOct 19, 2004
Priority date
Expiry dateMay 26, 2023

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y40/00
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Disclosed are a method, system and holder for transferring templates during imprint lithography processes. To that end, a method for handling a template, having a patterned mold thereon, in an imprint lithography system having a motion stage with a chucking device coupled thereto, includes providing the template into a template transfer holder. The template transfer holder includes a side coupled to the motion stage and support members extending from the side. The template is disposed within the template transfer holder so as to have the patterned mold facing the side and spaced-apart therefrom. Relative movement is created between the motion stage and an imprint head to place the template transfer holder and the imprint head in superimposition. The template is removed from the template transfer holder, and the template is suspended above the wafer chuck by the imprint head. In another embodiment, a system and a template holder are described that facilitates the method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.