Lithography rework analysis method and system
US6805283B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2002 |
| Grant date | Oct 19, 2004 |
| Priority date | — |
| Expiry date | Nov 15, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography rework analysis method and system. The method is applied to a system having a network server and a user computer having a browser interface. The method transfers initial data of various machines into the network database. The network database contains rework data of machines performing lithography rework operation. Analysis time node is input to the browser interface and the analysis time node is transferred to the network server. According to the analysis time node, the network server retrieves required data from the network database and displays the data on the browser interface. Rework data residing within the network database includes data table production time, product number, production line code, station code, department code, product code, mask rework pieces, measuring station, production machine, worker name, rework reason code, rework reason title, current status, wafer lot note item, rework time and rework region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.