Patent · US Expired

Members for semiconductor manufacturing apparatus and method for producing the same

US6805968B2 · kind B2 · utility

6Cited by
8References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 25, 2002
Grant dateOct 19, 2004
Priority date
Expiry dateDec 21, 2022

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC04B2235/447
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A member for a semiconductor manufacturing apparatus comprises a steel substrate and a composite oxide film formed on a surface thereof and comprised of silicon oxide-aluminum oxide-chromium oxide and a sintering aid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.