Patent · US Expired

Molded end point detection window for chemical mechanical planarization

US6806100B1 · kind B1 · utility

14Cited by
3References
32Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 24, 2002
Grant dateOct 19, 2004
Priority date
Expiry dateDec 24, 2022

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B21/04
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

An optical window structure for use in chemical mechanical planarization is provided. The optical window structure includes a polishing pad and an optical window opening in the polishing pad. The optical window structure also includes a molded optical window attached to an underside of the polishing pad, a molded portion of the optical window at least partially protruding into the optical window opening in the polishing pad.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.