Interconnect structure for an integrated circuit and corresponding fabrication method

US6806121B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Alexander Benedix · Hersbruck, DE
• Stefan Dankowski · Hersbruck, DE
• Reinhard Dueregger · Poing, DE
• Wolfgang Ruf · Friedberg, DE

Key dates

• Filing date: Oct 31, 2002
• Grant date: Oct 19, 2004
• Expiry date: Jan 4, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L2924/0002
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

The present invention relates to an interconnect structure for an integrated circuit (1) having a first interconnect (B1; B1′; B1″), which is composed of a plurality of interconnect sections (A11-A16; A11′-A16′; A11″-A14″) lying in a first and a second interconnect plane (M0, M1); and a second interconnect (B2; B2′; B2″), which runs adjacent to the first interconnect (B1; B1′; B1″) and which is composed of a plurality of interconnect sections (A21-A25; A21′-A25′; A21″-A23″) lying in the first and second interconnect planes (M0, M1); the first and second interconnects (B1; B1′; B1″; B2; B2′; B2″) being offset with respect to one another in the longitudinal direction in such a way that the interconnect sections (A12, A14, A16; A12′, A14′, A16′; A12″, A14″) of the first interconnect (B1; B1′; B1″) which lie in the first interconnect plane (M0) run at least in sections beside the interconnect sections (A22, A24; A22′; A24′; A21″, A23″) of the second interconnect (B2; B2′; B2″) which lie in the second in…