Correcting a mask pattern using a clip mask
US6807661B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 10, 2003 |
| Grant date | Oct 19, 2004 |
| Priority date | — |
| Expiry date | May 29, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Correcting a mask pattern includes partitioning the mask pattern to yield templates. The following is repeated for each template to generate correction data: a clip mask is generated for a template selected as a main template; the main template is merged with context templates to yield a merged template; the merged template is divided to yield segments including clip segments, where an intersection of the clip mask and the merged template defines an endpoint of a clip segment; a proximity correction procedure is performed on the segments to yield a corrected template; and correction data of the corrected template is selected according to the clip mask. The correction data for the templates are aggregated to correct the mask pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.