Robert Soper
7Patents
4h-index
7Co-inventors
42Inventor score
Filing activity: Jul 31, 2002 → Feb 17, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6787469B2 | Double pattern and etch of poly with hard mask | Electricity | 71 | Expired |
| US6764795B2 | Method and system for mask pattern correction | Physics | 25 | Expired |
| US7512928B2 | Sub-resolution assist feature to improve symmetry for contact hole lithography | Physics | 9 | Active |
| US7987436B2 | Sub-resolution assist feature to improve symmetry for contact hole lithography | Physics | 4 | Active |
| US6785878B2 | Correcting a mask pattern using multiple correction grids | Physics | 2 | Expired |
| US7341808B2 | Method and system for contiguous proximity correction for semiconductor masks | Physics | 1 | Expired |
| US6807661B2 | Correcting a mask pattern using a clip mask | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.