Method of cleaning ion source, and corresponding apparatus/system
US6812648B2 · kind B2 · utility
15Cited by
42References
18Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Apr 22, 2003 |
| Grant date | Nov 2, 2004 |
| Priority date | — |
| Expiry date | Apr 22, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/143
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and/or system for cleaning an ion source is/are provided. In certain embodiments of this invention, both the anode and cathode of the ion source are negatively biased during at least part of a cleaning mode. Ions generated are directed toward the anode and/or cathode in order to remove undesirable build-ups from the same during cleaning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.