Use of a coefficient of a power curve to evaluate a semiconductor wafer
US6812717B2 · kind B2 · utility
6Cited by
22References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2001 |
| Grant date | Nov 2, 2004 |
| Priority date | — |
| Expiry date | Feb 24, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/303
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A coefficient of a function that relates a measurement from a wafer to a parameter used in making the measurement (such as the power of a beam used in the measurement) is determined. The coefficient is used to evaluate the wafer (e.g. to accept or reject the wafer for further processing), and/or to control fabrication of another wafer. In one embodiment, the coefficient is used to control operation of a wafer processing unit (that may include, e.g. an ion implanter), or a heat treatment unit (such as a rapid thermal annealer).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.