Advanced illumination system for use in microlithography

US6813003B2 · kind B2 · utility

Inventors

• Mark Oskotsky · Mamaroneck, US
• Lev Ryzhikov · Norwalk, US
• Scott Coston · New Milford, US
• James Tsacoyeanes · Southbury, US
• Walter Augustyn · Monroe, US

Key dates

• Filing date: Jun 11, 2002
• Grant date: Nov 2, 2004
• Expiry date: Jun 19, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70183
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.