Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements
US6813034B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2002 |
| Grant date | Nov 2, 2004 |
| Priority date | — |
| Expiry date | Sep 13, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0608
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method is disclosed for evaluating isolated and aperiodic structure on a semiconductor sample. A probe beam from a coherent laser source is focused onto the structure in a manner to create a spread of angles incidence. The reflected light is monitored with an array detector. The intensity or polarization state of the reflected beam as a function of radial position within the beam is measured. Each measurement includes both specularly reflected light as well as light that has been scattered from the aperiodic structure into that detection position. The resulting output is evaluated using an aperiodic analysis to determine the geometry of the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.