Resist composition
US6815146B2 · kind B2 · utility
8Cited by
2References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 3, 2003 |
| Grant date | Nov 9, 2004 |
| Priority date | — |
| Expiry date | Mar 3, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition containing a fluoropolymer, an acid-generating compound and an organic solvent, a resist film, and methods for making thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.