Lithographic apparatus and device manufacturing method
US6815699B2 · kind B2 · utility
1Cited by
5References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2002 |
| Grant date | Nov 9, 2004 |
| Priority date | — |
| Expiry date | Dec 9, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70758
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.