Processing apparatus having integrated pumping system
US6817377B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2000 |
| Grant date | Nov 16, 2004 |
| Priority date | — |
| Expiry date | Feb 16, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86163
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus 115 for processing a substrate 20, comprises an integrated pumping system 155 having a high operating efficiency, small size, and low vibrational and noise levels. The apparatus 115 comprises a chamber, such as a load-lock chamber 110, transfer chamber 115, or process chamber 120. An integrated pump 165 is abutting or adjacent to one of the chambers 110, 115, 120 for evacuating gas from the chambers. In operation, the pump is located within the actual envelope or footprint of the apparatus and has an inlet 170 connected to a chamber 110, 115, 120, and an outlet 175 that exhausts the gas to atmospheric pressure. Preferably, the integrated pump 165 comprises a pre-vacuum pump or a low vacuum pump and is housed in a noise reducing enclosure having means for moving the pump between locations and means for stacking pumps vertically in use.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.