Electron beam position reference system
US6818906B1 · kind B1 · utility
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2References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2003 |
| Grant date | Nov 16, 2004 |
| Priority date | — |
| Expiry date | Jun 25, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3045
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for supporting and adjusting the position of an object in a vacuum includes inner and outer support rings that are connected by flexible mounts that are compliant along one axis and stiff along other axes, and drivers extending through the wall of the vacuum chamber that move the supports independently along their respective axes. At least the inner support is clamped after adjustment by a clamp that exerts a strong clamping pressure while exerting transverse force only less than a threshold selected to avoid motion after adjustment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.