ABERRATION MEASURING APPARATUS, ABERRATION MEASURING METHOD, PROJECTION EXPOSURE APPARATUS HAVING THE SAME MEASURING APPARATUS, DEVICE MANUFACTURING METHOD USING THE SAME MEASURING METHOD, AND EXPOSURE METHOD
US6819414B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 17, 2000 |
| Grant date | Nov 16, 2004 |
| Priority date | — |
| Expiry date | May 22, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An aberration measuring apparatus has a converging lens L disposed on the light path of light beam to converge light beam traveling through a measurement target optical system PL on a predetermined surface IP, an aperture stop AP disposed on the light path of light beam to transmit a part of the light beams, a converging position detection unit DET disposed on the predetermined surface to detect a positional deviation of a converging position P of a part of the light beams traveling through the aperture stop on the predetermined surface IP, a moving unit M connected the aperture stop to move the aperture stop within the light beam, and an arithmetic processing unit connected the converging position detection unit to calculate an aberration of the measurement target optical system PL on the basis of an output signal from the converging position detection unit DET.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.