Method and apparatus for removing a liquid from a surface
US6821349B2 · kind B2 · utility
6Cited by
12References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2001 |
| Grant date | Nov 23, 2004 |
| Priority date | — |
| Expiry date | Dec 20, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and an apparatus for removing a liquid, i.e. a wet processing liquid, from at least one surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate. Simultaneously or thereafter the liquid or the substrate is locally heated to thereby reduce the surface tension of said liquid. By doing so, at least locally a sharply defined liquid-ambient boundary is created. According to the invention, the substrate is subjected to a rotary movement at a speed to guide said liquid-ambient boundary over the surface of the substrate thereby removing said liquid from said surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.