Patent · US Expired

Optical beam guidance system and method for preventing contamination of optical components contained therein

US6824277B2 · kind B2 · utility

4Cited by

17References

13Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ansgar Freitag · Heidenheim, DE
Ulrich Bingel · Michelfeld, DE
Josef Distl · Oberkochen, DE
Uwe Hamm · Langenau, DE

Key dates

Filing date	Feb 22, 2002
Grant date	Nov 30, 2004
Priority date	—
Expiry date	Feb 22, 2022

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/31678
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for reducing the contamination of at least one optical component (2, 3) contained in the beam guidance space (6) and held by a frame (4, 5) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer (7) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.