Ultraviolet and vacuum ultraviolet antireflection substrate
US6829084B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2003 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Jun 9, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.