Kaname Okada
6Patents
4h-index
11Co-inventors
46Inventor score
Filing activity: Aug 6, 2001 → Dec 22, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6829084B2 | Ultraviolet and vacuum ultraviolet antireflection substrate | Physics | 18 | Expired |
| US6475575B1 | Pellicle and method for manufacture thereof | Chemistry; Metallurgy | 12 | Expired |
| US6795170B2 | Structure for attaching a pellicle to a photo-mask | Physics | 6 | Expired |
| US6744562B2 | Pellicle | Physics | 5 | Expired |
| US6628456B2 | Ultraviolet and vacuum ultraviolet antireflection substrate | Physics | 3 | Expired |
| US7934391B2 | Synthetic quartz glass body, process for producing the same, optical element, and optical apparatus | Emerging Cross-Sectional Technologies | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.