Projection optical system and projection exposure apparatus
US6829099B2 · kind B2 · utility
47Cited by
17References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2001 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Mar 30, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection optical system includes at least one lens, at least one concave mirror, at least one diffractive optical element, a first imaging optical system that includes the at least one lens and the at least one concave mirror, for imaging an intermediate image of an object, a second imaging optical system, having the at least one lens and the at least one diffractive optical element, for projecting the intermediate image onto an image plane, and a field optical system disposed between the first and second imaging optical systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.