Gas cluster ion beam size diagnostics and workpiece processing
US6831272B2 · kind B2 · utility
12Cited by
6References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 13, 2001 |
| Grant date | Dec 14, 2004 |
| Priority date | — |
| Expiry date | Jul 13, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0812
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and apparatus for measuring the distribution of cluster ion sizes in a gas cluster ion beam (GCIB) and for determining the mass distribution and mass flow of cluster ions in a GCIB processing system without necessitating the rejection of a portion of the beam through magnetic or electrostatic mass analysis. The invention uses time-of-flight measurement to estimate or monitor cluster ion size distribution either before or during processing of a workpiece. The measured information is displayed and incorporated in automated control of a GCIB processing system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.