System and method for electron beam irradiation
US6831278B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 1, 2002 |
| Grant date | Dec 14, 2004 |
| Priority date | — |
| Expiry date | Jan 5, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.