Edge termination in a trench-gate MOSFET
US6833583B2 · kind B2 · utility
11Cited by
2References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2002 |
| Grant date | Dec 21, 2004 |
| Priority date | — |
| Expiry date | Dec 14, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/519
Abstract
To avoid premature breakdown at the edge of the active area of RESURF trench-gate MOS device, an edge field plate (24) can be placed with a connection to the gate and a second spaced field plate (24) in the same trench (12). The gate trench network (12) could be either formed by hexagon unit cells or by square unit cells. Since the RESURF condition requires a small cell pitch, self-aligned processing could be used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.