Method for high precision printing of patterns
US6833854B1 · kind B1 · utility
23Cited by
10References
42Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 12, 2003 |
| Grant date | Dec 21, 2004 |
| Priority date | — |
| Expiry date | Jun 12, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An aspect of the present invention includes a method to print pattern with improved edge acuity. In one embodiment a method for printing fine patterns comprising the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categories differing in the phase of the complex amplitude. Other aspects of the present invention are reflected in the detailed description, figures and claims.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.