Stabilization technique for high repetition rate gas discharge lasers
US6834066B2 · kind B2 · utility
3Cited by
150References
30Claims
0Family size
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Key dates
| Filing date | Apr 18, 2001 |
| Grant date | Dec 21, 2004 |
| Priority date | — |
| Expiry date | Jul 14, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0975
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Method and system for providing stabilization techniques for high repetition rate gas discharge lasers with active loads provided in the discharge circuitry design which may include a resistance provided in the discharge circuitry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.