Characterizing in-situ deformation of hard pellicle during fabrication and mounting with a sensor array
US6834549B2 · kind B2 · utility
4Cited by
12References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2003 |
| Grant date | Dec 28, 2004 |
| Priority date | — |
| Expiry date | Apr 3, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/82
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system comprising a reticle, a pellicle and a plurality of sensors attached to at least one of the reticle or pellicle. The sensors are configured to sense in-situ strains on the pellicle as the pellicle is mounted to the reticle or frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.