Patent · US Expired

Antireflective, layer-forming composition, layer configuration containing the antireflective layer, and process for producing the antireflective layer

US6835456B2 · kind B2 · utility

1Cited by
8References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 23, 2002
Grant dateDec 28, 2004
Priority date
Expiry dateJul 6, 2022

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31725
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A layer-forming antireflective composition is proposed which contains as a base polymer poly(hydroxyamide) or polybenzoxazole and as dye component at least one dye from the classes of the methine dyes, methine dye derivatives, azomethine dyes, azomethine dye derivatives, coumarin dyes, coumarin dye derivatives, triphenylmethane dyes, triphenylmethane dye derivatives and/or an azo dye.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.