Specimen observation system for applying external magnetic field
US6838675B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 18, 2002 |
| Grant date | Jan 4, 2005 |
| Priority date | — |
| Expiry date | Jan 18, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/147
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
To prevent the displacement from an optical axis of a charged particle beam from being made independent of the direction (parallel to or perpendicular to the optical axis) of a magnetic field applied to a specimen, a system including an electron microscope and using a charged particle beam optical system is provided with a source of a charged particle beam, a condenser optical system, a specimen to be observed, a system for applying a magnetic field to the specimen, an imaging optical system and an image observation/recording apparatus, is provided with first and second charged particle beam deflection systems in order along a direction in which the charged particle beam travels between the condenser optical system and the specimen, is provided with third and fourth charged particle beam deflection systems in order between the specimen and the imaging lens system, and the quantity and the direction of the deflection of the charged particle beam by each deflection system and the intensity and the bearing of a magnetic field applied to the specimen are related according to predetermined relation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.