Enhanced illuminator for use in photolithographic systems
US6842223B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 11, 2003 |
| Grant date | Jan 11, 2005 |
| Priority date | — |
| Expiry date | Apr 11, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/701
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and apparatus for enabling both isolated and dense patterns to be accurately patterned onto a wafer are disclosed. According to one aspect of the present invention, an illumination system that is suitable for use as a part of a projection tool includes an illumination source and an illuminator aperture. The illuminator aperture has a center point and an outer edge, and also includes a first pole and a second pole. The first pole is defined substantially about the center point, and the second pole is defined substantially between the first pole and the outer edge of the first pole. The illumination source is arranged to provide a beam to the illuminator aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.