Patent · US Expired

Fusion attachment of rigid pellicles and/or frames

US6842227B2 · kind B2 · utility

6Cited by
4References
24Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 6, 2003
Grant dateJan 11, 2005
Priority date
Expiry dateMar 6, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/62
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A rigid pellicle, used to protect a patterned reticle from contamination in a lithographic process in the manufacture of integrated circuits, is attached to a mounting frame by fusing the pellicle and frame together. In one embodiment, an infrared laser beam is used to produce the fusion along the seam between the pellicle and the frame. The frame may also be attached to the reticle through a similar fusion process. In one embodiment, the pellicle, frame, and reticle are all comprised of fused silica.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.