Imprint lithography template comprising alignment marks
US6842229B2 · kind B2 · utility
67Cited by
93References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2003 |
| Grant date | Jan 11, 2005 |
| Priority date | — |
| Expiry date | Dec 29, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.