Rule based system and method for automatically generating photomask orders in a specified order format
US6842881B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2002 |
| Grant date | Jan 11, 2005 |
| Priority date | — |
| Expiry date | Jul 30, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/04
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present invention relates generally to a rule based system and method for automatically generating photomask orders in a specified format, and more particularly, relates to software which includes templates in which photomask order data is entered and rules for guiding the user in entering such data and rules for ensuring that such data is entered accurately. The rules and templates implemented in the present invention are organized and stored in a manner which allows for the software to be easily adapted to meet the criteria of any existing standard (e.g., SEMI P10) or proprietary photomask order format now known or hereinafter developed. Additionally, the software of the present invention provides for the ability to generate new photomask orders using templates and/or existing photomask order data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.