Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet
US6843892B1 · kind B1 · utility
15Cited by
11References
30Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 7, 2002 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Apr 17, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An in-line, multi-station apparatus including an improved pallet for transporting a plurality of workpieces/substrates through the apparatus, the pallet comprising: Embodiments include in-line apparatus for performing bias sputtering of electrically conductive thin films on insulative substrates in the manufacture of multi-layer magnetic and/or magneto-optical recording media.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.