Method & apparatus for multilayer deposition utilizing a common ion beam source
US6844031B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2004 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Apr 5, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/221
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A single, or common, ion beam source is utilized for ion beam deposition (IBD) of defect-free multilayer coatings, e.g., multilayer, carbon-based protective overcoats for magnetic and/or magneto-optical (MO) data recording/information storage and retrieval media such as hard disks. According to the inventive methodology, a plurality of source gas supply means for supplying a single IBD source with different source gases for each of the layers of the multilayer are selectively operated in “vent” and “run” modes by means of a plurality of valves, the opening and closing of which are determined by a programmable gas flow controller. The inventive method and apparatus advantageously provide IBD of multilayer coatings with minimum cross-contamination of individual layers, at a reduced equipment cost and size obtained by elimination of the need for separate ion beam sources and associated vacuum pump for each constituent layer of the multilayer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.