Polymers and photoresist compositions for short wavelength imaging
US6844270B2 · kind B2 · utility
0Cited by
6References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 2001 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Nov 26, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/948
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention includes polyacetal polymers and photoresist compositions that include the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm, particularly 157 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.