Patent · US Expired

Deposition apparatuses configured for utilizing phased microwave radiation

US6845734B2 · kind B2 · utility

32Cited by

14References

19Claims

0Family size

Assignee

Micron Technology, Inc. · US

Inventors

Craig M. Carpenter · Boise, US
Ross S. Dando · Nampa, US
Philip Campbell · Meridian, US

Key dates

Filing date	Apr 11, 2002
Grant date	Jan 25, 2005
Priority date	—
Expiry date	Sep 9, 2022

Classification

Technology area (CPC H)Electricity
CPC primaryH01Q21/0087
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The invention includes a deposition apparatus having a reaction chamber, and a microwave source external to the chamber. The microwave source is configured to direct microwave radiation toward the chamber. The chamber includes a window through which microwave radiation from the microwave source can pass into the chamber. The invention also includes deposition methods (such as CVD or ALD methods) in which microwave radiation is utilized to activate at least one component within a reaction chamber during deposition of a material over a substrate within the reaction chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.