Alignment and correction template for optical profilometric measurement
US6847460B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2002 |
| Grant date | Jan 25, 2005 |
| Priority date | — |
| Expiry date | Apr 22, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/6005
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An electronic template delineating distinct selected patterns corresponding to predetermined regions of interest in a sample part is used to limit analysis to those regions. The surface of the sample is first measured using conventional techniques. The data so acquired are used to identify boundaries between distinct regions, which are then compared to a predetermined pattern boundary in the template to find a best-fit match. The position of the pattern is then shifted to overlay the match, thereby automatically aligning the template's selected patterns with the regions of interest in the sample surface. As a result, profilometric analysis can be limited to the regions of interest. Correction factors are also assigned to each selected pattern in the template to account for physical differences in the corresponding regions of interest of the sample part that affect the profilometric measurement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.