Antireflective coating compositions comprising photoacid generators
US6849373B2 · kind B2 · utility
13Cited by
23References
10Claims
0Family size
Inventors
Key dates
| Filing date | Jul 14, 2001 |
| Grant date | Feb 1, 2005 |
| Priority date | — |
| Expiry date | Feb 18, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/128
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.