Beam processing apparatus
US6849857B2 · kind B2 · utility
327Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2002 |
| Grant date | Feb 1, 2005 |
| Priority date | — |
| Expiry date | Mar 22, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0827
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3), first electrode (4) disposed in the vacuum chamber (3), and a second electrode (5) disposed upstream of the first electrode (4) in the vacuum chamber (3). The beam processing apparatus further comprises a voltage applying unit for applying a variable voltage between the first electrode (4) and the second electrode (5) to alternately extract positive ions (6) and negative ions from the plasma generated by the plasma generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.