Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof
US6849957B2 · kind B2 · utility
10Cited by
3References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2000 |
| Grant date | Feb 1, 2005 |
| Priority date | — |
| Expiry date | Mar 21, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor device enabling precise and accurate measurement of an inspection mark in a simple manner is obtained. The semiconductor device includes a device forming area and a dicing line area arranged to surround the device forming area on a semiconductor substrate. In the dicing line area, first and second registration marks formed in different shots are provided, and the first and second registration marks include auxiliary marks for identifying the first and second registration marks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.