Low-loss waveguide and method of making same

US6850683B2 · kind B2 · utility

Assignee

• Massachusetts Institute of Technology · US

Inventors

• Kevin Lee · Cambridge, US
• Desmond Lim · Cambridge, US
• Kazumi Wada · Lexington, US
• Lionel C. Kimerling · Concord, US

Key dates

• Filing date: Jun 7, 2001
• Grant date: Feb 1, 2005
• Expiry date: Jun 7, 2021

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B2006/12176
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method of reducing the scattering losses that involves smoothing of the core/cladding interface and/or change of waveguide geometry in high refractive index difference waveguides. As an example, the SOI-based Si/SiO2 waveguides are subjected to an oxidation reaction at high temperatures, after the waveguide patterning process. By oxidizing the rough silicon core surfaces after the patterning process, the core/cladding interfaces are smoothened, reducing the roughness scattering in waveguides.