Exposure apparatus and device manufacturing method including gas purging of a space containing optical components
US6853439B1 · kind B1 · utility
4Cited by
11References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 3, 1998 |
| Grant date | Feb 8, 2005 |
| Priority date | — |
| Expiry date | Sep 3, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an illumination optical system for illuminating an original with ultraviolet light, a projection optical system for projecting a pattern of the original onto a substrate to be exposed and a gas purging means for replacing an inside space, which contains optical components of at least one of the illumination optical system and the projection optical system, with a gas having substantially no water content.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.